HJT板式等离子体增强化学气相沉积装备
HJT板式等离子体增强化学气相沉积装备
装备名称 Equipment Name
HJT板式等离子体增强化学气相沉积装备 HJT In-line PECVD
装备型号 Equipment Model
PD-1022/UD
装备用途 Equipment Application
制备本征及掺杂非晶硅薄膜。
Intrinsic film deposition & a-si film doping.
装备工艺 Processes
工艺气体在射频RF电磁场情形中电离相互反应，在衬底上沉积出响应的薄膜质料。
Ionized precursor gases deposit thin films on a substrate.
手艺特点 Features
1、较小反射功率的快速启辉、匀称稳固大面积成膜。
Quick RF ignition with least reflect power for uniform and stable film deposition.
2、成熟稳固的多点馈入射频RF手艺、手艺兼容性和产品升级。
Matured and stable multi-feed in RF technology compatible for even large process chamber.
3、腔体内反应间距可调、无邪的工艺窗口。
Continuous adjustable gas between diffuser and substrate providing flexible process possibilities.
4、大产能低本钱、定制装备结构。
High throughput with relative low cost, with capability of customized product design.
5、� ？榛杓票阌谧爸煤臀ぁ⒏弑曜嫉那寰采杓仆纺�。
Modularized design for easy installation and maintenance, together with highest safety protocol from design to fabrication.
装备参数 Parameters
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